For electrode production, plasma cutting, flaw detection | ||||||
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Chemical composition (not more, )% | ||||||
Fe | C | Si | Mn | P | S | O2 |
Base | 0,06 | 0,12 | 0,20 | 0,010 | 0,015 | 2,00 |
Base | 0,25 | 0,25 | 0,45 | 0,050 | 0,050 | 2,00 |
Granulometric composition - according to the customers' request. |